ফুয়েল সেল ক্যাটালিস্ট শুকানোর বাতি

Tue, 02 Jun 2026 08:48:35 +0800

On the lithography line, a soft bake that drifts even half a degree is enough to walk your CD curve and burn an hour of wafer starts. We built the fuel cell catalyst drying lamp to take that variability out of the thermal budget. It hits fast, dry heat in a near-infrared (NIR) band that lines up with photoresist absorption, so you get repeatable solvent removal without overshoot. What matters, technically The lamp runs on a narrow NIR band for rapid, volumetric heating. That means the photoresist surface and bulk heat together—less thermal lag, less gradient. Wafer-level uniformity holds ±0.1°C across the exposure field, and temperature repeatability stays tight cycle after cycle. The emitter sits in a quartz assembly built for Class 1–100 cleanrooms, with zero particle generation verified in-situ. Output stability is under 3% drift over 5,000 hours, which keeps pace with 24/7 fab schedules. Here’s why it sticks in photoresist processing: you need the same temperature profile for soft bake and hard bake, day or night, lot after lot. This lamp hits setpoint fast, holds it clean, and ramps down without a hitch—fewer reworks, better yield on tight nodes. The clean thermal profile also trims energy per wafer by not dumping waste heat into fixtures and exhaust. Over in packaging, that translates to fewer re-bakes and more consistent adhesion before wire bond. A couple things to keep in mind. Installation means matching the lamp to the chamber geometry and your fab’s utility envelope—voltage, amperage, coolant flow, and exhaust. Output intensity is tuned for photoresist; other materials may need a different NIR profile. Plan a short commissioning run to lock the recipe to your film stack. After that, the process stays repeatable with routine lamp inspection and calibration.

জ্বালানি on Compact IR Heating Units

ফুয়েল সেল ক্যাটালিস্ট শুকানোর বাতি